Dr. Bharat Kakati began his academic journey with a Bachelor’s degree in Science from Nowgong College in 2003, where he laid a strong foundation in the physical sciences. He continued to develop his academic focus with a Master’s degree in Physics, specializing in Electronics and Photonics, from Tezpur University in 2005. His keen interest in plasma and material sciences led him to pursue doctoral research at the Centre of Plasma Physics – Institute for Plasma Research (CPP-IPR), Assam, culminating in a Ph.D. in Physics in 2014. These formative years laid the groundwork for his future contributions to advanced material research, especially in silicon thin film technologies and plasma interactions.
Professional Endeavors
Dr. Kakati’s professional career is rich in research and teaching experiences. Starting as a Junior Research Fellow at CPP-IPR in 2008, he advanced to Senior Research Fellow, Project Scientist, and then completed a Post-Doctoral Fellowship at the prestigious Institute for Plasma Research (IPR), Gujarat from 2015 to 2017. Since February 2018, he has been serving as an Assistant Professor at Assam Science and Technology University, Guwahati. His career path demonstrates consistent dedication to experimental plasma physics, ionized environments, and the physics of silicon thin film deposition and modification processes in plasma systems.
Contributions and Research Focus
Dr. Bharat Kakati’s primary research interests lie in plasma-material interactions, ion-acoustic wave dynamics, dust-plasma interactions, and silicon thin film studies in plasma-based deposition techniques. He has extensively investigated how discharge conditions affect plasma parameters, especially in low-pressure hydrogen discharges. His innovative work on dust charging under magnetic fields and cesium-coated dust for negative ion production has garnered significant attention. His studies are crucial for the improvement of deposition techniques, such as plasma-enhanced chemical vapor deposition (PECVD), widely used in silicon thin film applications in electronics and solar cell industries.
Impact and Influence
Dr. Kakati has made a lasting impact on the Indian plasma science community, earning multiple prestigious accolades. He was awarded the Buti Young Scientist Award in 2011 by the Plasma Science Society of India (PSSI) for his pioneering research on cesium-coated dust. He has also received multiple Best Poster Awards at national symposiums for his innovative contributions. His work continues to influence the development of diagnostic techniques for plasma characterization and thin film research, particularly in silicon thin film processing and surface engineering.
Academic Cites
Dr. Kakati’s research output, including peer-reviewed publications and conference presentations, has been cited by scholars working in plasma physics, material science, and thin film technology. His empirical studies on plasma-dust interactions and ion wave propagation are foundational for researchers developing novel materials, especially in the context of silicon thin film devices. His work is frequently referenced in national symposiums and university seminars focused on plasma diagnostics and nanomaterials.
Legacy and Future Contributions
Dr. Bharat Kakati is poised to continue making significant contributions to the interdisciplinary field of plasma science and thin film technology. His teaching and mentorship at Assam Science and Technology University are nurturing the next generation of physicists in Northeast India. His future work is expected to focus on the optimization of thin film deposition processes and the exploration of novel plasma-based techniques for silicon thin film fabrication, with potential applications in renewable energy and microelectronics. His legacy is one of precision, innovation, and unwavering commitment to the advancement of science.
📘Silicon Thin Film
Dr. Bharat Kakati’s expertise in silicon thin film research has significantly advanced the understanding of plasma-assisted material processing. His studies on dust charging and wave propagation in plasma environments contribute directly to innovations in silicon thin film deposition. The continued evolution of silicon thin film technology is greatly influenced by his pioneering research and academic leadership.
Notable Publication
1️⃣ Fabrication of Microcrystalline Silicon Thin Film by Ionized Physical Vapor Deposition Process
Authors: S.K.M.K.M. R. Saikia, B. Kakati, T. Hazarika, S. Sharma, T. Rajbongshi, M. Das, S. Biswas
Journal: Crystals
Year: 2025
Citations: 2
2️⃣ Low-temperature DC argon plasma treatment of polysulfone membranes to enhance antifouling properties in oil-water emulsion separation
Authors: A. Rawal, T. Hazarika, B. Kakati, D. Pal
Journal: Surfaces and Interfaces
Year: 2025
Citations: 1
3️⃣ Development of a novel surface assisted volume negative hydrogen ion source
Authors: B. Kakati, S.S. Kausik, M. Bandyopadhyay, B.K. Saikia, P.K. Kaw
Journal: Scientific Reports
Year: 2017
Citations: 23
4️⃣ Effect of argon addition on plasma parameters and dust charging in hydrogen plasma
Authors: B. Kakati, S.S. Kausik, M. Bandyopadhyay, B.K. Saikia, Y.C. Saxena
Journal: Journal of Applied Physics
Year: 2014
Citations: 18
5️⃣ Effect of energetic electrons on dust charging in hot cathode filament discharge
Authors: B. Kakati, S.S. Kausik, B.K. Saikia, M. Bandyopadhyay
Journal: Physics of Plasmas
Year: 2011
Citations: 16
6️⃣ Effect of magnetic field on dust charging and corresponding probe measurement
Authors: D. Kalita, B. Kakati, B.K. Saikia, M. Bandyopadhyay, S.S. Kausik
Journal: Physics of Plasmas
Year: 2015
Citations: 14
7️⃣ Effect of process parameters on properties of argon–nitrogen plasma for titanium nitride film deposition
Authors: P. Saikia, B. Kakati
Journal: Journal of Vacuum Science & Technology A
Year: 2013
Citations: 14